2

RF power effect on TEOS/O2 PECVD of silicon oxide thin films

Year:
2005
Language:
english
File:
PDF, 123 KB
english, 2005
29

Growth kinetics of plasma deposited microcrystalline silicon thin films

Year:
2011
Language:
english
File:
PDF, 474 KB
english, 2011
30

PECVD of hydrogenated silicon thin films from SiH4+H2+Si2H6 mixtures

Year:
2004
Language:
english
File:
PDF, 94 KB
english, 2004
41

Arrhenius-like behavior in plasma reactions

Year:
1997
Language:
english
File:
PDF, 312 KB
english, 1997
44

Spatial profiles of reactive intermediates in rf silane discharges

Year:
1989
Language:
english
File:
PDF, 938 KB
english, 1989
45

Effective capture rates of carriers in amorphous hydrogenated silicon

Year:
1996
Language:
english
File:
PDF, 363 KB
english, 1996